JOURNAL OF PHYSICAL VAPOR DEPOSITION SCIENCE AND TECHNOLOGY
The Journal of Physical Vapor Deposition Science and Technology (JPVDST) is a peer reviewed journal of high quality devoted to the publication of original research papers from applied physics and their broad range of applications. JPVDST publishes quality original research papers, comprehensive review articles, survey articles, book reviews, dissertation abstracts in physical vapor deposition science and its applications in the broadest sense. It is intended that the journal may act as an interdisciplinary forum for physical vapor deposition (PVD) and its technologies. Innovative applications and material that brings together diverse areas of PVD science and technology are particularly welcome. Review articles in selected areas are published from time to time. It aims to disseminate knowledge; provide a learned reference in the field; and establish channels of communication between academic and research experts, policy makers and executives in industry, commerce and investment institutions. JPVDST is a quarterly specialized periodical dedicated to publishing original papers, letters and reviews in the physics, chemistry, engineering and technology of sputtering and film deposition and their applications.
SPONSORED BY THE EUROPEAN SOCIETY FOR MICRO AND NANO SCIENCES AND TECHNOLOGIES (ESMNST)
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